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    Please use this identifier to cite or link to this item: http://ir.nhri.org.tw/handle/3990099045/9339


    Title: Validation of a five-factor model of a Chinese Mandarin version of the Positive and Negative Syndrome Scale (CMV-PANSS) in a sample of 813 schizophrenia patients
    Authors: Wu, BJ;Lan, TH;Hu, TM;Lee, SM;Liou, JY
    Contributors: Center for Neuropsychiatric Research
    Abstract: OBJECTIVES: The Positive and Negative Syndrome Scale (PANSS) is one of the most widely used instruments for measuring the severity of schizophrenia. However, until now, there has not been a published, validated Chinese Mandarin version of the five-factor model PANSS with confirmatory factor analysis (CFA) for schizophrenic patients in Taiwan. METHODS: A total of 813 subjects were recruited. Internal consistency was evaluated with Cronbach's alpha coefficient. For test re-test reliability, 57 patients were reassessed and intra-class correlation coefficients were calculated. For validity, exploratory factor analysis (EFA) and confirmatory factor analysis (CFA) using a Structured Equation Model were implemented to identify the factor model. RESULTS: The Cronbach's alpha coefficient was 0.928. The intra-class coefficient was 0.878 (95% CI: 0.79-0.92). The final model was composed of five factors. EFA explained a total of 64.2% of the variance. CFA indicated a good fitting model. Except for the PANSS items G7 (motor retardation), G8 (uncooperativeness), N5 (abstract thinking), and G10 (disorientation), this study found that the items loaded on these factors were similar to the consensus items published in prior studies. CONCLUSIONS: In summary, these findings support the Chinese Mandarin version of the PANSS as a reliable and valid instrument for the assessment of the severity of psychopathology in hospitalized, stable patients with schizophrenia. More effective and specific treatment models targeting sub-culture differences are expected to be developed in future studies.
    Date: 2015-12
    Relation: Schizophrenia Research. 2015 Dec;169(1-3):489-490.
    Link to: http://dx.doi.org/10.1016/j.schres.2015.09.011
    JIF/Ranking 2023: http://gateway.webofknowledge.com/gateway/Gateway.cgi?GWVersion=2&SrcAuth=NHRI&SrcApp=NHRI_IR&KeyISSN=0920-9964&DestApp=IC2JCR
    Cited Times(WOS): https://www.webofscience.com/wos/woscc/full-record/WOS:000366458600076
    Cited Times(Scopus): http://www.scopus.com/inward/record.url?partnerID=HzOxMe3b&scp=84946422763
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